| 摘要 |
PROBLEM TO BE SOLVED: To provide a laminate which allows for processing of a workpiece with high accuracy, and fabrication of a fine pattern reflecting the fine pattern accuracy of a cover film in the workpiece surface.SOLUTION: A fine mask structure (16) comprises: a workpiece (20); and a fine mask pattern (16a) provided, at least partially, on the surface of the workpiece (20), while leaving an exposed part on at least a part of the outer edge. The fine mask pattern (16a) includes a first mask layer (13) provided on the workpiece (20), as a fine uneven structure, and a second mask layer (12) provided on the top of the protrusion of the first mask layer (13). |
