发明名称 STACKED WAFER WITH COOLANT CHANNELS
摘要 <p>A wafer assembly with internal fluid channels. The assembly is fabricated by creating one or more channels in a first surface of a first semiconductor wafer and creating an oxide surface on the first surface of the first semiconductor wafer. An oxide surface is also created on a first surface of a second semiconductor wafer. The assembly is fabricated by bonding the oxide surface of the first surface of the first semiconductor wafer to the oxide surface of the first surface of the second semiconductor wafer to create a wafer assembly and to seal the one or more channels at edges defined by the bonded first and second surfaces.</p>
申请公布号 WO2014158250(A1) 申请公布日期 2014.10.02
申请号 WO2013US74395 申请日期 2013.12.11
申请人 RAYTHEON COMPANY 发明人 KOONTZ, CHRISTOPHER R.;WONG, TSE E.;MILNE, JASON G.
分类号 H01L25/065;H01L21/98;H01L23/473 主分类号 H01L25/065
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