发明名称 |
METHOD FOR TESTING CHARGE GENERATION LAYER AND PROCESS FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTORS ON LARGE SCALE |
摘要 |
A method is provided for testing a charge generation layer disposed directly on an undercoat layer disposed directly on an aluminum-based cylindrical support member formed by extrusion and drawing having a periphery not subjected to cutting work. The method includes testing the charge generation layer for a defect or a suspected defect by irradiating the charge generation layer with light, and receiving reflected light from the charge generation layer with a light receiving device. The light emitted to the charge generation layer has a wavelength within the range of the absorption wavelengths of the charge generation layer, and whose transmittance to the undercoat layer is 0.3% or less. |
申请公布号 |
US2014295058(A1) |
申请公布日期 |
2014.10.02 |
申请号 |
US201414229525 |
申请日期 |
2014.03.28 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Kitamura Wataru;Tokimitsu Ryoichi;Nonaka Masaki;Murakami Mai |
分类号 |
G01N21/95;G03G5/047 |
主分类号 |
G01N21/95 |
代理机构 |
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代理人 |
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主权项 |
1. A method for inspecting a charge generation layer of an object including an aluminum-based cylindrical support member formed by extrusion and drawing having a periphery free of cutting work, an undercoat layer disposed directly on the periphery of the support member and having a transmittance of 1% or more for light having a wavelength in the visible region, and the charge generation layer disposed directly on the undercoat layer and having absorption wavelengths, the method comprising:
testing the charge generation layer for a defect or a suspected defect by:
irradiating the charge generation layer with light, andreceiving reflected light from the charge generation layer with a light receiving device, wherein the light has a wavelength within the range of the absorption wavelengths of the charge generation layer, and transmittance to the undercoat layer of the light is 0.3% or less. |
地址 |
Tokyo JP |