发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
摘要 The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.
申请公布号 US2014293400(A1) 申请公布日期 2014.10.02
申请号 US201414216229 申请日期 2014.03.17
申请人 CHI MEI CORPORATION 发明人 TSENG CHING-YUAN
分类号 G03F7/075;G02F1/167 主分类号 G03F7/075
代理机构 代理人
主权项 1. A photosensitive resin composition comprising: a polysiloxane polymer (A); a compound having an ethylenically unsaturated group (B); a photoinitiator (C); a solvent (D); a pigment (E); and a crosslinking agent (F); wherein the pigment (E) comprises at least one selected from the group consisting of titanium dioxide, calcium carbonate, calcium sulfate, zinc oxide, barium sulfate, barium carbonate, silicon dioxide, aluminum powder, kaolin, clay, talc, montmorillonite, aluminum hydroxide, magnesium carbonate, and white hollow polymer microspheres.
地址 Tainan City TW