发明名称 RECORDING APPARATUS
摘要 A recording apparatus includes a recording processing unit that crosses a supporting stage; and a Y axis movement unit that causes the recording processing unit to move. The Y axis movement unit includes a guide rail of a reference side and a guide rail of a following side that support the recording processing unit to be free sliding; a first rail attachment base, which is fixed to the supporting stage, and to which the guide rail of the reference side is attached; and a second rail attachment base, which is fixed to the supporting stage, and to which the guide rail of the following side is attached. The first rail attachment base includes an attachment reference portion, and the load that the first rail attachment base receives from the recording processing unit is greater than that received by the second rail attachment base.
申请公布号 US2014293373(A1) 申请公布日期 2014.10.02
申请号 US201414220393 申请日期 2014.03.20
申请人 SEIKO EPSON CORPORATION 发明人 ONISHI Ryoichi
分类号 H04N1/10 主分类号 H04N1/10
代理机构 代理人
主权项 1. A recording apparatus, comprising: a stage, which includes a supporting surface that supports a recording medium; a recording processing unit, which includes a recording unit that performs recording on the supported recording medium, and bridges a first direction so as to cross the stage; and a movement unit, which causes the recording processing unit to move in relation to the stage in a second direction that is perpendicular to the first direction and is parallel to the supporting surface, wherein the movement unit includes a first guide rail, which supports the recording processing unit to be free sliding in the second direction in relation to the stage;a second guide rail, which is provided separated from the first guide rail in the first direction, and supports the recording processing unit to be free sliding in the second direction in relation to the stage;a first rail attachment base, which includes a first attachment surface to which the first guide rail is attached, and is fixed to the stage; anda second rail attachment base, which includes a second attachment surface to which the second guide rail is attached, and is fixed to the stage, wherein the first rail attachment base includes a reinforcement portion of a thickness that protrudes from the first attachment surface, and the load that the first rail attachment base receives from the recording processing unit is greater than that received by the second rail attachment base.
地址 TOKYO JP