HEAD CLEANING METHOD AND LIQUID DISCHARGING APPARATUS

摘要

In a liquid discharging apparatus that includes a circulation flow path, a head cleaning method includes a first process in which a flow rate of the liquid flowing through the circulation flow path per unit time is set at a first flow rate; a second process in which, after the first process is completed, a wiping unit carries out a wiping operation in a state where the liquid is discharged from the nozzle; a third process in which, after the second process is completed, the wiping unit carries out the wiping operation in a state where the liquid is not discharged from the nozzle; and a fourth process in which, after the third process is completed, a flow rate of the liquid flowing through the circulation flow path per unit time is set at a second flow rate that is lower than the first flow rate.

主权项

1. A head cleaning method in a liquid discharging apparatus that includes a circulation flow path having a head at which a nozzle is provided to discharge liquid onto a recording medium, a storage unit that stores the liquid, a first flow path through which the liquid is supplied from the storage unit to the head, and a second flow path through which the liquid flows back to the storage unit from the head; a pump that circulates the liquid through the circulation flow path; and a wiping unit that moves relative to the head in a state where the wiping unit is in contact with a nozzle opening surface of the head and thus, carries out a wiping operation in which foreign matter adhering to the nozzle opening surface is wiped off, the head cleaning method comprising:
a first process of setting a flow rate of the liquid flowing through the circulation flow path per unit time at a first flow rate; a second process of carrying out the wiping operation by the wiping unit in a state where the liquid is discharged from the nozzle after the first process is completed; a third process of carrying out the wiping operation by the wiping unit in a state where the liquid is not discharged from the nozzle after the second process is completed; and a fourth process of setting a flow rate of the liquid flowing through the circulation flow path per unit time at a second flow rate that is lower than the first flow rate after the third process is completed.