| 摘要 |
A method of manufacturing a surface plasmonic color filter using laser interference lithography comprises the steps of: (a) forming a metal film on a substrate; (b) forming a photosensitive layer on the metal film; (c) forming a nanohole array having periodicity on the photosensitive layer by irradiating the photosensitive layer with a laser interference patterns; (d) forming the nanohole array on the metal film by etching the metal film using the nanohole array of the photosensitive layer; and (e) removing the photosensitive layer having the nanohole array from the metal film having the nanohole array, and forming a dielectric layer on the metal film having the nanohole array. |
