发明名称 |
FOCUSED ION BEAM APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam apparatus which enables the shortening of a down time for replacement of an emitter and the increase in operation rate.SOLUTION: A focused ion beam apparatus comprises: an ion source room 10 in which an emitter 11 capable of emitting an ion beam is provided; a focused ion beam barrel 20 for focusing and directing the ion beam emitted by the ion source room 10; a preliminary chamber 30 whose inside communicates to inside the focused ion beam barrel 20 through a first communicating hole 21; a pump 35 for the preliminary chamber for evacuating the preliminary chamber 30 to create a vacuum; an on-off valve 40 for opening and closing the first communicating hole 21; and a transport device 45 for transporting the ion source room 10 to inside the focused ion beam barrel 20 and the preliminary chamber 30 through the first communicating hole 21. |
申请公布号 |
JP2014186943(A) |
申请公布日期 |
2014.10.02 |
申请号 |
JP20130062460 |
申请日期 |
2013.03.25 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORP |
发明人 |
MATSUDA OSAMU;YASAKA KOJIN;ARAMAKI BUNRO |
分类号 |
H01J37/317 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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