发明名称 FOCUSED ION BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a focused ion beam apparatus which enables the shortening of a down time for replacement of an emitter and the increase in operation rate.SOLUTION: A focused ion beam apparatus comprises: an ion source room 10 in which an emitter 11 capable of emitting an ion beam is provided; a focused ion beam barrel 20 for focusing and directing the ion beam emitted by the ion source room 10; a preliminary chamber 30 whose inside communicates to inside the focused ion beam barrel 20 through a first communicating hole 21; a pump 35 for the preliminary chamber for evacuating the preliminary chamber 30 to create a vacuum; an on-off valve 40 for opening and closing the first communicating hole 21; and a transport device 45 for transporting the ion source room 10 to inside the focused ion beam barrel 20 and the preliminary chamber 30 through the first communicating hole 21.
申请公布号 JP2014186943(A) 申请公布日期 2014.10.02
申请号 JP20130062460 申请日期 2013.03.25
申请人 HITACHI HIGH-TECH SCIENCE CORP 发明人 MATSUDA OSAMU;YASAKA KOJIN;ARAMAKI BUNRO
分类号 H01J37/317 主分类号 H01J37/317
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