发明名称 PHOTOSENSITIVE COMPOSITION, CURED FILM AND ITS MANUFACTURING METHOD AND ELECTRONIC PARTS
摘要 PROBLEM TO BE SOLVED: To achieve enhancing curability of a resin composition and a photosensitive composition suitably used for forming a surface protective film and an interlayer insulator which electronic parts and the like have, and reducing an internal stress remaining on a board when forming a cured film on the board using the composition.SOLUTION: There is provided a photosensitive composition containing (A) a resin having a phenolic hydroxyl group, (B1) a crosslinking agent having at least two oxazoline groups, (B2) a crosslinking agent having at least two groups represented by -CHOR, where R is a hydrogen atom, an alkyl group or an acetyl group having 1 to 10 carbon atoms, and (C) a photosensitive acid generator.
申请公布号 JP2014186300(A) 申请公布日期 2014.10.02
申请号 JP20130238814 申请日期 2013.11.19
申请人 JSR CORP 发明人 SAKURAI TOMOHIKO;HANAMURA MASAAKI
分类号 G03F7/023;C08J3/24;G03F7/038;H01L21/027 主分类号 G03F7/023
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