| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an imprint mold with high yield, the imprint mold having a main pattern and a dummy pattern with different sizes each other formed in the same surface thereof.SOLUTION: A method for producing a nanoimprint mold in which a main pattern and a dummy pattern with a size larger than that of the main pattern are formed on the same pattern formation surface includes a step of preparing a hard mask pattern having a first opening corresponding to the main pattern and a second opening pattern corresponding to the dummy pattern, on a base material where a nanoimprint mold is configured, etching the base material using the hard mask pattern as a mask and forming both the main pattern and the dummy pattern. The first opening is formed by using an imprint mold for forming the first opening to form a resin pattern to an imprint resin on a hard mask layer, the imprint mold having a fine projecting pattern corresponding to the first opening, and etching the hard mask layer using the resin pattern as a mask. |
