发明名称 SUBSTRATE IMPRINTED WITH A PATTERN FOR FORMING ISOLATED DEVICE REGIONS
摘要 An example provides a method for forming an apparatus including a substrate imprinted with a pattern for forming isolated device regions. A method may include imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level, and depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes. The method may include depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions.
申请公布号 WO2014158187(A1) 申请公布日期 2014.10.02
申请号 WO2013US34610 申请日期 2013.03.29
申请人 APPLIED MATERIALS, INC. 发明人 BRUG, JAMES A;ZHAO, LIHUA;TAUSSIG, CARL A,
分类号 H01L21/027 主分类号 H01L21/027
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