COMPOUND, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

摘要

Provided are a compound, actinic-ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, a method for manufacturing an electronic device using the same, and an electronic device, whereby high resolution and exposure latitude, and good pattern shape are realized in a minute (e.g., a line width or space width of 50 nm or less) region of pattern formation by an actinic-ray-sensitive or radiation-sensitive resin composition containing a compound represented by general formula (1) or (2). In the general formulas, R1-R5 each independently represent an organic group. At least two of R1-R3 may bond with each other and form a ring. At least one of R1-R3 and at least one of R4 and R5 each has at least one type of group selected from the group consisting of groups represented by general formulas (I)-(IV) described in the specification. Z- represents a non-nucleophilic anion.