发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>Provided is a photosensitive resin composition which exhibits excellent chemical resistance when formed into a cured film, and which is capable of suppressing panel display unevenness of a display device when incorporated into a liquid crystal display device or the like in the form of a cured film, and is also capable of suppressing panel display unevenness even under harsh conditions such as high temperature, high humidity and high pressure. A photosensitive resin composition which contains (A) a polymer that has (a1) a constituent unit having an acid group and (a2) a constituent unit having a crosslinkable group, (B) a quinonediazide compound, (C) at least one nitrogen-containing heterocyclic compound and (D) a solvent. The nitrogen-containing heterocyclic compound contains two or more nitrogen-containing aromatic rings, and at least two of the nitrogen-containing aromatic rings are fused or directly bonded with each other. The structure wherein the nitrogen-containing aromatic rings are fused or directly bonded with each other contains a structure of formula (c-1) or a structure of formula (c-2). In formula (c-1) and formula (c-2), * represents a binding site with another atom. AA Formula (c-1) BB Formula (c-2)</p>
申请公布号 WO2014156873(A1) 申请公布日期 2014.10.02
申请号 WO2014JP57509 申请日期 2014.03.19
申请人 FUJIFILM CORPORATION 发明人 SHIMOYAMA TATSUYA
分类号 G03F7/004;G02F1/1333;G03F7/023;G03F7/40;H01L51/50;H05B33/22 主分类号 G03F7/004
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