发明名称 |
SPUTTERING PROCESS FOR SPUTTERING A TARGET OF CARBON |
摘要 |
The sputtering process according to the present disclosure comprises providing a target consisting of carbon in a sputtering apparatus, introducing a process gas essentially consisting of a neon or a gas mixture comprising at least 60% neon into said apparatus, applying a pulsed power discharge to said target in order to create a plasma of said process gas, sputtering said target by means of said plasma. The process is able to ionize a significant amount of sputtered carbon atoms. |
申请公布号 |
EP2694696(A4) |
申请公布日期 |
2014.10.01 |
申请号 |
EP20120768675 |
申请日期 |
2012.03.26 |
申请人 |
IONAUTICS AB |
发明人 |
HELMERSSON, ULF;BRENNING, NILS;AIJAZ, ASIM |
分类号 |
C23C14/06;C23C14/32;C23C14/35 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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