| 摘要 |
<p>A vapor chamber, comprising a lower shell and an upper shell, wherein at least one gas-tight and liquid-tight intermediate area is formed between lower shell and upper shell, in which area a fluid working medium is accommodated and a porous material that interacts with the fluid is arranged; the porous material is in contact, at least in some areas, with the upper shell and/or the lower shell, but does not completely fill the at least one intermediate area, forming at least one cavity-like vapor gap. The upper shell of the vapor chamber has on its top side a plurality of indentations which are distributed over the surface thereof, extend towards the lower shell and act as sample receptacles, into which samples to be temperature-controlled can be introduced from the top using the vapor chamber.</p> |
