| 摘要 |
<p>A method of acquiring a settling time according to an aspect of the present invention comprises the steps of: depicting a reference pattern by at least one short of charged particle beams formed by using first and second forming apertures, and a deflector for deflecting the charged particle beams passing between the first and second forming apertures on at least one test piece; depicting an evaluation pattern in which the width size of a pattern after the formation coincides with a reference design pattern by a combination of a second short of charged particle beams having first and second patterns of different sizes, by using the first and second apertures and the deflector on the test piece for each setting time while varying the settling time of a digital to analog converter (DAC) amplifier for controlling the deflector for formation of the second short of beams; measuring the width size of the reference pattern; measuring the width size of an evaluation pattern for each settling time, and calculating a differential value between the width size of the reference pattern and the width size of the evaluation pattern for each settling time to acquire the settling time of the DAC amplifier a differential value of which is a reverse value or less.</p> |
