发明名称 |
AN ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING A BATCH OF SUBSTRATES AND METHOD THEREOF |
摘要 |
<p>The invention relates to a method that includes providing a reaction chamber module of an atomic layer deposition reactor for processing a batch of substrates by an atomic layer deposition process, and loading the batch of substrates before processing into the reaction chamber module via a different route than the batch of substrates is unloaded after processing. The invention also relates to a corresponding apparatus.</p> |
申请公布号 |
EP2783023(A1) |
申请公布日期 |
2014.10.01 |
申请号 |
EP20110876170 |
申请日期 |
2011.11.22 |
申请人 |
PICOSUN OY |
发明人 |
LINDFORS, SVEN;SOININEN, PEKKA J. |
分类号 |
C23C16/455;H01L31/18 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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