| 摘要 |
PURPOSE: An inductively coupled plasma processing apparatus is provided to form a uniform electric field in an arranging region by forming each antenna part through antenna lines of an eddy shape. CONSTITUTION: A dielectric wall(2) is formed in a top side of a process chamber(4). An outer antenna part(13a) and an inner antenna part(13b) are formed in both sides of the dielectric wall. An intermediate antenna part(13c) is formed between the outer antenna part and the inner antenna part. The outer antenna part forms an induced electric field in an outer part inside the process chamber. The inner antenna part forms an induced electric field in an inner part. The intermediate antenna part forms an induced electric field in a central part. A variable capacitor(21a,21c) is connected to the intermediate antenna part in order to control plasma density distribution of the inductively coupled plasma. Each antenna part forms a multi-antenna of an eddy shape. |
