发明名称 PHOTOCURABLE COMPOSITION, BARRIER LAYER COMPRISING THE SAME AND ENCAPSULATED APPARATUS COMPRISING THE SAME
摘要 The present invention relates to a photocurable composition comprising: a photocurable monomer (A); a monomer of chemical formula 1 or an oligomer thereof (B); and a photocurable composition including an initiator (C), to a barrier layer comprising the same, and to an encapsulated apparatus comprising the same. The present invention implements an organic barrier layer which has a remarkably low generation rate of out gas, a high photocurable rate, and high adhesive power to an inorganic layer, thereby implementing a layer which prevents degradation of performance of a device when sealing the device, and enlarges lifespan. Also, the present invention has a high photocurable rate and can implement a layer in which shift does not occur when sealing the device.
申请公布号 KR20140115883(A) 申请公布日期 2014.10.01
申请号 KR20130031164 申请日期 2013.03.22
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, CHANG MIN;CHOI, SEUNG JIB;HA, KYOUNG JIN;KO, SUNG MIN;KWON, JI HYE;NAM, SEONG RYONG;OH, SE IL;LEE, YEON SOO;LEE, JI YEON
分类号 C08F20/10;C08F30/00;C08L33/04;H01L23/29 主分类号 C08F20/10
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