发明名称 |
PHOTOCURABLE COMPOSITION, BARRIER LAYER COMPRISING THE SAME AND ENCAPSULATED APPARATUS COMPRISING THE SAME |
摘要 |
The present invention relates to a photocurable composition comprising: a photocurable monomer (A); a monomer of chemical formula 1 or an oligomer thereof (B); and a photocurable composition including an initiator (C), to a barrier layer comprising the same, and to an encapsulated apparatus comprising the same. The present invention implements an organic barrier layer which has a remarkably low generation rate of out gas, a high photocurable rate, and high adhesive power to an inorganic layer, thereby implementing a layer which prevents degradation of performance of a device when sealing the device, and enlarges lifespan. Also, the present invention has a high photocurable rate and can implement a layer in which shift does not occur when sealing the device. |
申请公布号 |
KR20140115883(A) |
申请公布日期 |
2014.10.01 |
申请号 |
KR20130031164 |
申请日期 |
2013.03.22 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
LEE, CHANG MIN;CHOI, SEUNG JIB;HA, KYOUNG JIN;KO, SUNG MIN;KWON, JI HYE;NAM, SEONG RYONG;OH, SE IL;LEE, YEON SOO;LEE, JI YEON |
分类号 |
C08F20/10;C08F30/00;C08L33/04;H01L23/29 |
主分类号 |
C08F20/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|