发明名称 SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING THE SINTERED OBJECT, AND PROCESS FOR PRODUCING SPUTTERING TARGET COMPRISING THE SINTERED OBJECT
摘要 <p>An oxide sintered compact composed of a composite oxide of lanthanum and hafnium, wherein the amount of hafnium contained in the sintered compact is equivalent or more relative to the lanthanum. A method of producing an oxide sintered compact of lanthanum and hafnium, wherein La 2 (CO 3 ) 3 powder and HfO 2 powder are used as raw material powder, blending and mixing are performed so that the composition molar ratio of Hf and La becomes 1 to 1.2, the mixed powder is thereafter heated and synthesized in the atmosphere, the synthesized material is subsequently pulverized to obtain powder, and the synthesized powder is thereafter hot pressed into a sintered compact. Since metal lanthanum rapidly bonds with oxygen and decays, and lanthanum oxide bonds with moisture and forms a hydroxide and changes into powder form, there is a problem in that long-term storage is difficult and a sputtering target cannot be used for a practical use. In light of these points, provided is a stable La-containing oxide sintered compact composed of oxides of lanthanum (La) and hafnium (Hf), and in particular provided is a La-containing oxide sputtering target that is suitable for forming a high-k gate insulating film.</p>
申请公布号 EP2298712(B1) 申请公布日期 2014.10.01
申请号 EP20090794308 申请日期 2009.06.23
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 SATOH KAZUYUKI;KOIDO YOSHIMASA
分类号 C04B35/00;C04B35/50;C23C14/34 主分类号 C04B35/00
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