<p>An etching apparatus according to an embodiment of the present invention comprises a supporting member which slopingly supports a substrate; a first spraying member which sprays etching liquid to the substrate; and a second spraying member which sprays a lot more amount of the etching liquid than that of the first spraying member to the substrate. The first spraying member is arranged closely to the lower end of the substrate, and the second spraying member is arranged closely to the upper end of the substrate.</p>
