MAGNETIC ANNEALING APPARATUS

摘要

An objective of the present invention is to provide a magnetic annealing apparatus capable of performing magnetic annealing process of two methods including a perpendicular magnetization method and an in-plane magnetization method. The magnetic annealing apparatus magnetic-anneals a workpiece maintained in a processed body maintenance member using a flat type superconducting magnet as a magnetic field generation unit. The magnetic annealing apparatus includes: a receiving container to receive the workpiece before magnetic annealing process; and a workpiece conveyance mechanism to convey the workpieces held in the receiving container to the workpiece maintenance member. The workpiece conveyance mechanism may hold the workpieces in a horizontal state or in a vertical state. Further, an objective of the present invention is to provide a magnetic annealing apparatus capable of reducing attaching of impurities to a semiconductor wafer. The magnetic annealing apparatus magnetic-anneals a workpiece maintained in a processed body maintenance member using a flat type superconducting magnet as a magnetic field generation unit. The magnetic annealing apparatus includes: a workpiece maintenance member capable of maintaining the workpieces; a receiving container to receive the workpiece; a workpiece conveyance mechanism to convey the workpieces between workpiece maintenance members; a transfer mechanism to transfer the workpiece held in the workpiece maintenance member in the magnetic field generation unit; a clean gas introducing unit to introduce clean gas; and an exhaust unit to exhaust the clean gas. A flow direction of the clean gas formed by the clean gas introducing unit and the exhaust unit is parallel to main surfaces of the workpiece held in the workpiece maintenance member.