发明名称 Charged particle beam apparatus, drawing apparatus, and method of manufacturing article
摘要 A charged particle beam apparatus, which processes an object with a charged particle beam, includes: a detector having a detection surface, and configured to detect a charged particle beam incident on a partial region of the detection surface; and a controller configured to make target incident positions of charged particle beams, to be sequentially incident on the detection surface, different from each other.
申请公布号 US8847180(B2) 申请公布日期 2014.09.30
申请号 US201313772419 申请日期 2013.02.21
申请人 Canon Kabushiki Kaisha 发明人 Suzuki Takehiko
分类号 G21K5/04;H01J37/317;G03F7/20;H01J37/244 主分类号 G21K5/04
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. A charged particle beam apparatus comprising: a detector, having a detection surface, configured to perform an intensity detection on a charged particle beam incident on the detection surface; an adjusting unit configured to perform an intensity adjustment on the charged particle beam based on a result of the intensity detection; a processing unit configured to perform a process on an object with the charged particle beam on which the intensity adjustment has been performed; and a changing unit configured to change a relative position of the charged particle beam with respect to the detection surface so that the charged particle beam, which has been incident on a first position on the detection surface, on which the intensity detection has been performed by the detector, on which the intensity adjustment have been performed by the adjusting unit and with which the process on the object has been performed by the processing unit, is incident on a second position different from the first position on the detection surface.
地址 JP