| 摘要 |
Provided is a pump cleaning apparatus of a semiconductor process system that includes a reaction gas generation part for generating reaction gas active species supplied to a fore line; and a control part for controlling the operation of the reaction gas generation part. The pump cleaning apparatus is equipment for controlling a byproduct and a pump of a semiconductor process system including a fore line between a pump and a process chamber, a pump connected to a process chamber, and the process chamber for a semiconductor process. |
