| 摘要 |
<p>An exposure apparatus includes a nozzle member (70) which has at least one of a supply port (12) for supplying a liquid (LQ) and a recovery port (22) for recovering the liquid (LQ), and a nozzle adjusting mechanism (80) which adjusts at least one of a position and a posture of the nozzle member (70) depending on a position or a posture of a substrate (P). The exposure apparatus forms an immersion area of the liquid (LQ) on the substrate (P), and performs exposure for the substrate (P) through the liquid (LQ) in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.</p> |
