发明名称 |
Robust joint structure for flip-chip bonding |
摘要 |
An integrated circuit structure includes a first work piece and a second work piece. The first work piece includes a copper bump at a main surface of the first work piece and having a first dimension; and a nickel-containing barrier layer over and adjoining the copper bump. The second work piece is bonded to the first work piece and includes a bond pad at a main surface of the second work piece; and a solder mask at the main surface of the second work piece and having a solder resist opening with a second dimension exposing a portion of the bond pad. A ratio of the first dimension to the second dimension is greater than about 1. Further, a solder region electrically connects the copper bump to the bond pad, with a vertical distance between the bond pad and the copper bump being greater than about 30 μm. |
申请公布号 |
US8847387(B2) |
申请公布日期 |
2014.09.30 |
申请号 |
US201012842304 |
申请日期 |
2010.07.23 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Hsiao Ching-Wen;Chuang Yao-Chun;Chen Chen-Shien;Kuo Chen-Cheng;Huang Ru-Ying |
分类号 |
H01L23/48;H01L23/00;H01L23/498 |
主分类号 |
H01L23/48 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. An integrated circuit structure comprising:
a first work piece comprising:
an under bump metallurgy (UBM) at a main surface of the first work piece;a copper bump over the UBM and having a first dimension in a first plane parallel to the main surface of the first work piece; anda nickel-containing barrier layer over and adjoining the copper bump; a second work piece bonded to the first work piece and comprising:
a bond pad at a main surface of the second work piece; anda solder mask at the main surface of the second work piece and having a solder resist opening with a second dimension exposing a portion of the bond pad, wherein the second dimension is measured in a second plane parallel to the main surface of the second work piece, and wherein a ratio of the first dimension to the second dimension is greater than about 1; and a solder region electrically connecting the copper bump to the bond pad, wherein the solder region contacts a surface of the nickel-containing barrier layer facing the second work piece to form an interface, and substantially does not contact sidewalls of the copper bump, wherein the interface has a dimension substantially equal to the first dimension. |
地址 |
Hsin-Chu TW |