发明名称 Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material
摘要 This invention relates to a method for manufacturing a cation exchange resin, wherein the method includes the steps of: copolymerizing a monovinyl aromatic monomer and a cross-linkable aromatic monomer to obtain a cross-linked copolymer; specifying a content of a leachable compound represented by formula (I) to be 400 μg or less relative to 1 g of the cross-linked copolymer,; wherein Z represents a hydrogen atom or an alkyl group, and l represents a natural number; and then sulfonating the cross-linked copolymer to form a sulfonylated cross-linked copolymer.
申请公布号 US8846773(B2) 申请公布日期 2014.09.30
申请号 US201213466446 申请日期 2012.05.08
申请人 Kurita Water Industries Ltd. 发明人 Fukui Takeo;Mizuniwa Tetsuo;Tokunaga Kazuhiko;Yasutomi Masako
分类号 B01J41/14 主分类号 B01J41/14
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method for manufacturing a cation exchange resin, the method comprising: (1) copolymerizing a monovinyl aromatic monomer and a cross-linkable aromatic monomer, then crosslinking, to obtain a cross-linked copolymer; (2) specifying a content of a leachable compound or oligomer represented by formula (I) to be 400 μg or less relative to 1 g of the cross-linked copolymer, wherein: Z represents a hydrogen atom or an alkyl group; l represents a natural number; and the specifying comprises at least two steps selected from the group consisting of (i) adjusting the polymerizing temperature within the range of room temperature or higher to 250° C. or lower,(ii) employing at least one oxygen-degassed monomer.,(iii) employing at least one monomer from which a polymerization inhibitor is removed,(iv) employing a cross-linkable aromatic monomer having reduced impurities,(v) adjusting a proportion of the cross-linkable aromatic monomer within the range of 0.5 to 30 percent by weight relative to a total weight of monomers, and(vi) washing the cross-linked copolymer with a solvent at a washing temperature ranging from 50° C. or higher to 150° C. or lower; and then (3) sulfonating the cross-linked copolymer to form a sulfonylated cross-linked copolymer.
地址 Tokyo JP
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