| 摘要 |
The present invention relates to a sensor moving apparatus for a deposition chamber, which can facilitate the replacement of a sensor detecting the thickness of a film and can improve position reproducibility of the sensor, in the deposition chamber. The sensor moving apparatus includes: a deposition chamber; a sensor which detects the thickness of a film made of a deposition material deposited on a substrate by being evaporated by an evaporation source of the deposition chamber; a sensor head which has the sensor built therein and is seated on a support of the deposition chamber; a sensor block which is connected to the sensor head to be attached to or detached from the outer surface of the deposition chamber; a guide shaft which serves as a guide to improve position reproducibility of the sensor when the sensor block is attached to or detached from the outer surface of the deposition chamber; a moving member which is arranged to move on the guide shaft as the sensor block is coupled to the guide shaft; a through hole which is formed on a side surface of the deposition chamber such that the sensor head can be brought into the deposition chamber; a deposition material moving tube which leads the deposition material evaporated in the deposition chamber to move to the sensor; and the support on which the sensor head is seated such that the sensor can be positioned on the deposition material moving tube, and which is provided on the top of a sensing unit. According to the present invention, the guide shaft can be provided in the deposition chamber, thereby facilitating the replacement of a sensor, not requiring space for sensor replacement, and improving position reproducibility of the sensor. |
