Method and system for semiconductor process control and monitoring by using a data quality metric

摘要

During fault detection of a production process, the influence of the data communication process for communicating measurement readings to the fault detection system may be taken into consideration. In one illustrative embodiment, a data rate related parameter may be used as an input variable for a data reduction procedure, thereby enabling an efficient assessment of the quality of the remaining “real” process and tool parameters.

主权项

1. A method of monitoring a production process for processing microstructure devices in at least one process tool, the method comprising:
performing a data communication process so as to communicate a plurality of measurement data at least several times from said at least one process tool to a fault detection system during processing of a microstructure device; determining a data communication quality metric in said fault detection system, said data communication quality metric comprising a momentary data rate between successive measurements generated for each of the plurality of measurement data and indicating at least a degree of completeness of said measurement data; and performing a fault detection process in said fault detection system using said plurality of measurement data and said data communication quality metric as inputs to the fault detection process.