COATING APPARATUS OF PHOTORESIST AND METHOD FOR COATING PHOTORESIST USING THE SAME

摘要

The present invention relates to a photoresist coating apparatus and a method for photoresist coating using the same, wherein the photoresist coating apparatus improves homogeneity of photoresist which is applied to form a blank mask for a flat panel display (FPD). The photoresist coating apparatus, according to the present invention comprises a photoresist discharge nozzle for applying photoresist on a transparent substrate and a drying nozzle for drying the applied photoresist. The drying nozzle is spaced apart from the photoresist discharge nozzle in an opposite direction of a movement direction of the photoresist discharge nozzle. Drying of photoresist using the drying nozzle is performed through a method of spraying gas with heat, a method of using radiant heat from a heat-generating device, and so forth.