| 发明名称 | Magnetic device and method of manufacturing the same | ||
| 摘要 | A method of manufacturing a magnetic device includes forming a stack structure, the stack structure including a magnetic layer, and etching the stack structure by using an etching gas, the etching gas including at least 80% by volume of H2 gas. | ||
| 申请公布号 | US8847342(B2) | 申请公布日期 | 2014.09.30 |
| 申请号 | US201213600422 | 申请日期 | 2012.08.31 |
| 申请人 | Samsung Electronics Co., Ltd. | 发明人 | Lee Woo-cheol;Ken Tokashiki;Kwon Hyung-joon;Jung Myung-hoon |
| 分类号 | H01L27/22 | 主分类号 | H01L27/22 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. A magnetic device, comprising: at least one magnetic resistive device on a substrate, the magnetic resistive device having sidewalls with a substantially vertical profile and layers stacked in a vertical direction, wherein a height of the at least one magnetic resistive device is at least 1.5 times a width of the at least one magnetic resistive device. | ||
| 地址 | Suwon-si, Gyeonggi-do KR | ||