发明名称 Transistor including multiple reentrant profiles
摘要 A transistor includes a substrate. A first electrically conductive material layer is positioned on the substrate. A second electrically conductive material layer is in contact with and positioned on the first electrically conductive material layer. The second electrically conductive material layer includes a reentrant profile. The second electrically conductive material layer also overhangs the first electrically conductive material layer.
申请公布号 US8847226(B2) 申请公布日期 2014.09.30
申请号 US201112986210 申请日期 2011.01.07
申请人 Eastman Kodak Company 发明人 Tutt Lee W.;Nelson Shelby F.
分类号 H01L29/41;H01L29/786 主分类号 H01L29/41
代理机构 代理人 Zimmerli William R.
主权项 1. A transistor comprising: a substrate; a first electrically conductive material layer positioned on the substrate; a second electrically conductive material layer in contact with and positioned on the first electrically conductive material layer, the second electrically conductive material layer itself including a first reentrant profile in which a first portion of the second electrically conductive material layer overhangs a second portion of the second electrically conductive material layer, the first electrically conductive material layer extending in opposite directions, the first electrically conductive material layer being sized and positioned to end in both directions before the second electrically conductive material layer ends such that the second electrically conductive material layer defines a second reentrant profile relative to the first electrically conductive material layer in which the second electrically conductive material layer overhangs the first electrically conductive material layer, wherein the first reentrant profile is different from the second reentrant profile, an electrically insulating material layer conformally positioned over the second electrically conductive material layer, the first electrically conductive material layer, and at least a portion of the substrate; and a semiconductor material layer that conforms to and is in contact with the electrically insulating material layer.
地址 Rochester NY US