发明名称 |
Method and apparatus for neutral beam processing based on gas cluster ion beam technology |
摘要 |
An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials. |
申请公布号 |
US8847148(B2) |
申请公布日期 |
2014.09.30 |
申请号 |
US201113215514 |
申请日期 |
2011.08.23 |
申请人 |
Exogenesis Corporation |
发明人 |
Kirkpatrick Sean R.;Kirkpatrick Allen R. |
分类号 |
H01J37/00;H01J37/147;H01J37/317;H01J37/05 |
主分类号 |
H01J37/00 |
代理机构 |
Burns & Levinson LLP |
代理人 |
Burns & Levinson LLP ;Cohen Jerry;Gomes David W |
主权项 |
1. A method of treating a surface of a workpiece comprising the steps of:
providing a reduced pressure chamber; forming a gas cluster ion beam comprising gas cluster ions within the reduced pressure chamber; accelerating the gas cluster ions to form an accelerated gas cluster ion beam along a beam path within the reduced pressure chamber; promoting fragmentation and/or dissociation of at least a portion of the accelerated gas cluster ions along the beam path by increasing the range of velocities of ions in the accelerated gas cluster ion beam; removing charged particles from the beam path to form an accelerated neutral beam along the beam path in the reduced pressure chamber; holding a workpiece in the beam path; and treating at least a portion of a surface of the workpiece by irradiating it with the accelerated neutral beam. |
地址 |
Billerica MA US |