Method for removing oxides

摘要

A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, exposing the substrate to a gas mixture while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.

主权项

1. A deposition method comprising:
positioning a substrate having a native oxide layer on a substrate support plate in a processing chamber; providing a gas mixture to the processing chamber using a resistively heated showerhead comprising a heating element that is a resistive heater; thermally activating the gas mixture; exposing the native oxide layer on the substrate to the activated gas mixture within the processing chamber while maintaining the substrate at a temperature below 65° C. to form a volatile film on the substrate; and heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the native oxide layer by heat generated by the heating element and radiated from the resistively heated showerhead.