发明名称 |
Optoelectronic devices having electrode films and methods and system for manufacturing the same |
摘要 |
A method and system for DC magnetron sputtering deposition of films on plastic substrates. The method includes using a shield to block deposition in a spatial region corresponding to a plasma region formed during magnetron sputtering. An optoelectronic device including an amorphous electrode film is also disclosed. |
申请公布号 |
US8845866(B2) |
申请公布日期 |
2014.09.30 |
申请号 |
US200511316267 |
申请日期 |
2005.12.22 |
申请人 |
General Electric Company |
发明人 |
Yan Min;Erlat Ahmet Gun;Liu Jie |
分类号 |
C23C14/00;C23C14/32;C23C14/35;C23C14/04;C23C14/08 |
主分类号 |
C23C14/00 |
代理机构 |
|
代理人 |
Klindtworth Jason K. |
主权项 |
1. A method of making an electrode film, the method comprising:
providing a target; moving a substrate relative to the target; positioning a shield to preferentially block a spatial region of sputtered target material from depositing on the substrate, wherein the spatial region corresponds to a higher density plasma region of plasma formed during DC magnetron sputtering, wherein the shield is held stationary relative to the target; and DC magnetron sputtering said target to deposit an electrode film on the substrate. |
地址 |
Niskayuna NY US |