发明名称 Optoelectronic devices having electrode films and methods and system for manufacturing the same
摘要 A method and system for DC magnetron sputtering deposition of films on plastic substrates. The method includes using a shield to block deposition in a spatial region corresponding to a plasma region formed during magnetron sputtering. An optoelectronic device including an amorphous electrode film is also disclosed.
申请公布号 US8845866(B2) 申请公布日期 2014.09.30
申请号 US200511316267 申请日期 2005.12.22
申请人 General Electric Company 发明人 Yan Min;Erlat Ahmet Gun;Liu Jie
分类号 C23C14/00;C23C14/32;C23C14/35;C23C14/04;C23C14/08 主分类号 C23C14/00
代理机构 代理人 Klindtworth Jason K.
主权项 1. A method of making an electrode film, the method comprising: providing a target; moving a substrate relative to the target; positioning a shield to preferentially block a spatial region of sputtered target material from depositing on the substrate, wherein the spatial region corresponds to a higher density plasma region of plasma formed during DC magnetron sputtering, wherein the shield is held stationary relative to the target; and DC magnetron sputtering said target to deposit an electrode film on the substrate.
地址 Niskayuna NY US