发明名称 |
Positive photoresist composition, coating film thereof, and novolac phenol resin |
摘要 |
A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1);;[In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2); |
申请公布号 |
US8846297(B2) |
申请公布日期 |
2014.09.30 |
申请号 |
US201214110311 |
申请日期 |
2012.04.10 |
申请人 |
DIC Corporation |
发明人 |
Imada Tomoyuki;Kage Takakazu;Imaizumi Norifumi |
分类号 |
G03F7/039;C08G8/08;C08G8/12;C08L61/06;C08G8/20;C09D161/06;G03F7/021;G03F7/023 |
主分类号 |
G03F7/039 |
代理机构 |
Edwards Wildman Palmer LLP |
代理人 |
Edwards Wildman Palmer LLP ;Armstrong, IV James E. |
主权项 |
1. A positive photoresist composition comprising 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A), wherein the novolac phenol resin (B) has a repeating structural unit represented by formula (1) below: [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2) below: (In the formula, R1, R2, and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; and t represents 1 or 2) or an aromatic hydrocarbon group (x2) other than the structure (x1)], wherein a content of the structure (x1) relative to the total number of the structure (x1) and the structure (x2) is 85% or more. |
地址 |
Tokyo JP |