发明名称 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus
摘要 An electrophotographic photosensitive member having a surface layer which contains a silicon-containing compound in an amount of less than 0.6% by mass based on the whole solid content in the surface layer, where the silicon-containing compound in the surface layer has a siloxane moiety in an amount of 0.01% by mass or more, based on the whole solid content in the surface layer, and its surface has specific depressions. Also disclosed are a process cartridge and an electrophotographic apparatus which have the electrophotographic photosensitive member.
申请公布号 US8846281(B2) 申请公布日期 2014.09.30
申请号 US200913059629 申请日期 2009.09.24
申请人 Canon Kabushiki Kaisha 发明人 Okuda Atsushi;Uesugi Hirotoshi;Noguchi Kazunori;Nishida Tsutomu
分类号 G03G15/00;G03G5/04;G03G5/147;G03G5/05;G03G21/00 主分类号 G03G15/00
代理机构 Fitzpatrick, Cella, Harper and Scinto 代理人 Fitzpatrick, Cella, Harper and Scinto
主权项 1. An electrophotographic photosensitive member which comprises a support and a photosensitive layer provided on the support, wherein; a surface layer of the electrophotographic photosensitive member contains a silicon-containing compound in an amount of less than 0.6% by mass based on the whole solid content in the surface layer; the silicon-containing compound in the surface layer has a siloxane moiety in an amount of 0.01% by mass or more, based on the whole solid content in the surface layer; on the surface of the electrophotographic photosensitive member, depressions which are independent from one another are formed in a number of from 50 or more to 70,000 or less per unit area (100 μm ×100 μm), and the depressions are depressions each having a ratio of depth (Rdv) to major-axis diameter (Rpc), Rdv/Rpc, of from more than 0.3 to 7.0 or less and having a depth (Rdv) of from 0.1 μm or more to 10.0 μm or less; the surface layer has, at the outermost surface thereof, a silicon element in a presence proportion of 0.6% by mass or more, based on constituent elements thereat, as measured by X-ray photoelectron spectroscopy (ESCA); and the presence proportion [A (% by mass)] of the silicon element to the constituent elements in the surface layer at an inner part of 0.2 μm from the outermost surface thereof and the presence proportion [B (% by mass)] of the silicon element to the constituent elements at the outermost surface thereof as measured by X-ray photoelectron spectroscopy (ESCA) are in a ratio (A/B) of from more than 0.0 to less than 0.3; and the silicon-containing compound is a polymer having a structure represented by the following Formula (1) and a repeating structural unit represented by the following Formula (2) or the following Formula (3): wherein R1 and R2 each independently represent a hydrogen atom, a halogen atom, an alkoxyl group, a nitro group, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; and m represents an average value of the number of repeating structural units each shown in parentheses, and is in the range of from 1 to 500; and wherein X represents a single bond, —O—, —S— or a substituted or unsubstituted alkylidene group; and R3 to R10 each independently represent a hydrogen atom, a halogen atom, an alkoxyl group, a nitro group, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; or wherein X and Y each represent a single bond, —O—, —S— or a substituted or unsubstituted alkylidene group; and R11 to R18 each independently represent a hydrogen atom, a halogen atom, an alkoxyl group, a nitro group, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group.
地址 Tokyo JP
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