发明名称 |
IMPRINT METHOD AND IMPRINT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method which prevents damages etc. of a mold and stably manufactures a highly accurate pattern structure, and to provide an imprint device.SOLUTION: An imprint device 1 includes: at least a mold holding part 2 for holding a mold; a substrate holding part 4 for holding a transfer substrate; a resin supply part 6 which supplies a molded resin to the transfer substrate; and a static eraser 8 which supplies ions to the mold held by the mold holding part. The static eraser 8 at least includes a discharge electrode 9 which generates ions and a power source which supplies a voltage to the discharge electrode 9. The ions generated from the discharge electrode 9 are moved by coulomb force. |
申请公布号 |
JP2014183069(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20130054670 |
申请日期 |
2013.03.18 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
ITO KIMIO;ODA HIROKAZU |
分类号 |
H01L21/027;B29C59/02;G11B5/84;G11B7/26;H01T23/00;H05F3/04 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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