发明名称 LOW PRESSURE ARC PLASMA IMMERSION COATING DEPOSITION AND ION PROCESSING
摘要 PROBLEM TO BE SOLVED: To provide a low pressure arc plasma immersion coating deposition and ion processing in which improved coating properties is achieved by generating high energy particles in a coating process.SOLUTION: A coating system comprises a vacuum chamber and a coating assembly. The coating assembly comprises a vapor source, a substrate holder, an anode electrically connected to and separated from a cathode target, and a cathode chamber assembly. The cathode chamber assembly comprises the cathode target, a selective main anode, and a shield for insulating the cathode target from the vacuum chamber. The shield forms an opening from the cathode target to a separated anode so that electron emission current of a separated arc discharge flows along longitudinal direction of a target plane. A first current source is connected between the cathode target and the main anode and a second current source is connected between the cathode target and the separated anode. Linear dimension of the separate anode and a dimension of the vapor source along short direction is parallel to dimension along which the arc spot is lead along the cathode target.
申请公布号 JP2014181406(A) 申请公布日期 2014.09.29
申请号 JP20140051750 申请日期 2014.03.14
申请人 VAPOR TECHNOL INC 发明人 VLADIMIR GOROKHOVSKY;GRANT WILLIAM;EDWARD TAYLOR;DAVID HUMENIK
分类号 C23C14/32 主分类号 C23C14/32
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