发明名称 FUNCTIONAL FILM FORMING METHOD AND FUNCTIONAL FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a functional film on a surface of a sheet-like substrate by an aerosol deposition method (AD method).SOLUTION: A functional film forming method has: a decompression space forming process of bringing a decompression chamber, which is capable of covering a functional film forming region of a part or all of a substrate in which a protective layer by resist is formed on a surface other than a functional film forming region, into contact with the functional film forming region on the substrate so as to cover the region, and forming a local decompression space in the decompression chamber; a decompression process of reducing pressure in the local decompression space; a film forming process of supplying a fine power material to the local decompression space in a decompressed state, ejecting and colliding the fine powdery material at high speed onto the substrate by an aerosol deposition method to fuse the material, and forming a functional film on a functional film forming region of the substrate; and a removing process of removing the protective layer on the substrate surface.
申请公布号 JP2014180618(A) 申请公布日期 2014.09.29
申请号 JP20130056302 申请日期 2013.03.19
申请人 TORAY ENG CO LTD 发明人 IKEMORI KAZUHIRO
分类号 B05D1/12;B05C5/00;B05C15/00;B05D1/32;B05D3/12;B05D7/24 主分类号 B05D1/12
代理机构 代理人
主权项
地址