发明名称 HEIGHT STANDARD SAMPLE, METHOD FOR MANUFACTURING THE SAME, AND DEVICE FOR MANUFACTURING HEIGHT STANDARD SAMPLE
摘要 PROBLEM TO BE SOLVED: To manufacture a standard sample with high accuracy.SOLUTION: A method for manufacturing a height standard sample comprises a step for selectively irradiating a first region 20 out of the first region 20 and a second area 22 with an oxygen ion 42 so that difference in level is formed at a boundary between the first region 20 and the second area 22 on a surface of a silicon substrate 10.
申请公布号 JP2014181934(A) 申请公布日期 2014.09.29
申请号 JP20130054962 申请日期 2013.03.18
申请人 FUJITSU LTD 发明人 SHIGENO MAYUMI;KATAOKA YUJI
分类号 G01N1/00;G01N1/28;G01N1/32;G01Q40/02 主分类号 G01N1/00
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