发明名称 |
HEIGHT STANDARD SAMPLE, METHOD FOR MANUFACTURING THE SAME, AND DEVICE FOR MANUFACTURING HEIGHT STANDARD SAMPLE |
摘要 |
PROBLEM TO BE SOLVED: To manufacture a standard sample with high accuracy.SOLUTION: A method for manufacturing a height standard sample comprises a step for selectively irradiating a first region 20 out of the first region 20 and a second area 22 with an oxygen ion 42 so that difference in level is formed at a boundary between the first region 20 and the second area 22 on a surface of a silicon substrate 10. |
申请公布号 |
JP2014181934(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20130054962 |
申请日期 |
2013.03.18 |
申请人 |
FUJITSU LTD |
发明人 |
SHIGENO MAYUMI;KATAOKA YUJI |
分类号 |
G01N1/00;G01N1/28;G01N1/32;G01Q40/02 |
主分类号 |
G01N1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|