发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can reduce a time for removing a resin without damaging a constituent component.SOLUTION: A semiconductor device manufacturing method comprises a resin removal process of causing a condenser lens 60 to condense laser beams L having a wavelength at which a resin 20 has an absorption ratio of the laser beams L larger than that of a constituent component 10. In a region formed by the laser beams L which passed the condenser lens 60, when assuming that a region having energy that damages the constituent component 10 is a first region L1 and a region having energy smaller than the energy of the first region L1 is a second region L2, irradiation on the first region L1 is performed only on the resin 20 to remove the resin 20.
申请公布号 JP2014183198(A) 申请公布日期 2014.09.29
申请号 JP20130056831 申请日期 2013.03.19
申请人 DENSO CORP 发明人 MAWATARI KAZUAKI;SUGIKI MIKIO
分类号 H01L21/56;B23K26/00;B23K26/04;B23K26/064;B23K26/36 主分类号 H01L21/56
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