发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can reduce a time for removing a resin without damaging a constituent component.SOLUTION: A semiconductor device manufacturing method comprises a resin removal process of causing a condenser lens 60 to condense laser beams L having a wavelength at which a resin 20 has an absorption ratio of the laser beams L larger than that of a constituent component 10. In a region formed by the laser beams L which passed the condenser lens 60, when assuming that a region having energy that damages the constituent component 10 is a first region L1 and a region having energy smaller than the energy of the first region L1 is a second region L2, irradiation on the first region L1 is performed only on the resin 20 to remove the resin 20. |
申请公布号 |
JP2014183198(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20130056831 |
申请日期 |
2013.03.19 |
申请人 |
DENSO CORP |
发明人 |
MAWATARI KAZUAKI;SUGIKI MIKIO |
分类号 |
H01L21/56;B23K26/00;B23K26/04;B23K26/064;B23K26/36 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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