| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaporation source and a vacuum vapor deposition apparatus which are capable of increasing the degree of freedom in layout of a nozzle and a lid, or capable of preventing nozzle clogging caused by a vapor deposition material or fixation of the lid being a supply port of the vapor deposition material even in high-rate vapor deposition.SOLUTION: An evaporation source has: a crucible equipped with an opening used for inputting a vapor deposition material into a holding part which holds the vapor deposition material inside, a lid for closing the opening, a nozzle from which the vapor deposition material is discharged for a vapor deposition target, and a housing holding the lid and the nozzle; and heating means for heating the crucible. The heating means performs local heating to the crucible, by which a region having higher temperature than temperature at which the vapor deposition material condenses is formed in a region in the crucible closer to the nozzle, and a region having lower temperature than temperature at which the vapor deposition material condenses is formed in a region farther than the region having higher temperature from the nozzle, and the evaporation source has condensation means for condensing the vapor deposition material in the region having lower temperature. |
