| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron microscope system capable of highly accurately detecting an outline even of an arbitrary two-dimensional pattern shape or pattern arrangement.SOLUTION: The electron microscope system includes: SEM image acquisition means; initial outline extraction means for extracting an edge of a pattern from an SEM image, as an initial outline; profile calculation means for calculating a profile of a waveform of a local signal on the initial outline; two-dimensional shape evaluation means for calculating an index value indicating a feature of a two-dimensional shape of the pattern; library means for storing information of a waveform of the SEM image in association with a sectional shape for each two-dimensional shape of model patterns; library matching means for checking information of the profile of the waveform of the local signal on the initial outline and information of the index value against the information of the SEM waveform, and selecting a waveform of the SEM image; and outline output means for obtaining an outline at a predetermined height of the pattern on the basis of a sectional shape of the model pattern corresponding to the selected waveform of the SEM image, and outputting the outline. |
