| 摘要 |
The objective of the present invention is to form a thin film with low permittivity and tolerance to HF, in a low temperature region. The present invention has borazine ring frame and includes a process of forming a thin film which includes preset element, boron, carbon, and nitrogen, by performing preset times, under a condition which maintains the borazine ring frame in an organic borazine composite, a cycle which includes a process of supplying a first raw material gas including preset element and the halogen radical to a substrate, a step of supplying a second raw material gas including preset element and amino radical to the substrate, a process of supplying a reaction gas including the organic borazine composite to the substrate, and a step of supplying a carbon-containing gas to the substrate. |
