PHASE-SHIFT MASK BLANK AND ITS MANUFACTURING METHOD, METHOD FOR MANUFACTURING PHASE-SHIFT MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

The present invention provides a phase shift mask blank for manufacturing a display device, which performs a valid phase effect by wet etching and is capable of forming a cross-section shape. The phase shift mask blank comprises: a transparent substrate (21); a light semi-transmitting film (22) which is formed on a main surface of the transparent substrate (21), changes a light phase of a representative wavelength included in an exposure light at 180 degrees, and includes a chromium-based material; and an etching mask film (23) formed on the light semi-transmitting film (22) and includes a metal silicide-based material.