| 摘要 |
<p>The present invention pertains to a pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. In a mask provided for manufacturing an alignment film, slits, which are provided for exposure treatment, are made so as to gradually narrow toward the ends in the longitudinal direction.</p> |
