发明名称 METHOD OF ACQUIRING SETTLING TIME
摘要 PROBLEM TO BE SOLVED: To provide a method of acquiring an appropriate settling time in molding deflection for changing a graphic size.SOLUTION: A method of acquiring a settling time includes the steps of: drawing one or more reference patterns formed from charged particle beams of at least one molded shot on samples; drawing an evaluation pattern of which the pattern width size after resolution becomes equal with that of the reference pattern in design on the samples at every settling time while varying the settling time of a DAC amplifier for controlling a deflector regarding beam molding of the second shot, the evaluation pattern being formed by combining charged particle beams of two shots molded in first and second patterns of different sizes; calculating a differential between the pattern width size of the reference pattern and the pattern width size of the evaluation pattern at every settling time; and acquiring such a DAC amplifier settling time that the differential becomes equal or less than a threshold value.
申请公布号 JP2014183267(A) 申请公布日期 2014.09.29
申请号 JP20130058125 申请日期 2013.03.21
申请人 NUFLARE TECHNOLOGY INC 发明人 NISHIMURA RIEKO;SAKAI MICHIHIRO
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
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