发明名称 FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS
摘要 PROBLEM TO BE SOLVED: To provide a scalable and cost-effective continuous flow projection lithography system and fabrication method capable of fabricating microparticles or microstructures of a custom shape and composition.SOLUTION: A mask 304 is placed at a distance from a microlens array 306. Each element of the array projects one image of the mask onto a substrate, effectively forming an array on the substrate. A coating process allows functional regions of particles, namely, supporting layers that prevent adhesion of crosslinked polymers to surfaces.
申请公布号 JP2014182372(A) 申请公布日期 2014.09.29
申请号 JP20140032697 申请日期 2014.02.24
申请人 PALO ALTO RESEARCH CENTER INC 发明人 MELDE KAI;PHILIPP H SCHMAELZLE
分类号 G03F7/207;G03F7/23;G03F7/24 主分类号 G03F7/207
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