发明名称 |
FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS |
摘要 |
PROBLEM TO BE SOLVED: To provide a scalable and cost-effective continuous flow projection lithography system and fabrication method capable of fabricating microparticles or microstructures of a custom shape and composition.SOLUTION: A mask 304 is placed at a distance from a microlens array 306. Each element of the array projects one image of the mask onto a substrate, effectively forming an array on the substrate. A coating process allows functional regions of particles, namely, supporting layers that prevent adhesion of crosslinked polymers to surfaces. |
申请公布号 |
JP2014182372(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20140032697 |
申请日期 |
2014.02.24 |
申请人 |
PALO ALTO RESEARCH CENTER INC |
发明人 |
MELDE KAI;PHILIPP H SCHMAELZLE |
分类号 |
G03F7/207;G03F7/23;G03F7/24 |
主分类号 |
G03F7/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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