SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To instantly dry a liquid on a surface of a substrate when the substrate is dried and maintain cleanliness of front and rear surfaces of the substrate after cleaning and drying.SOLUTION: In a substrate processing apparatus 10, a substrate processing chamber 40 comprises: a cleaning fluid supply section 47 which supplies a cleaning fluid onto a surface of the substrate W; a solvent supply section 48 which replaces the cleaning fluid on the surface of the substrate W with a volatile solvent; heating means 51 which heats the substrate W to which the volatile solvent is supplied; and dry means that eliminates liquid balls generated by the volatile solvent on the surface of the substrate W through heating action of the heating means 51 to dry the surface of the substrate W. The substrate processing apparatus 10 further includes cooling means which cools the substrate dried by the dry means.